Used and Refurbished Semiconductor Cleaning Systems
Browse/Search by Keyword(s): clean
FPM
SC 4102
-
$2,950
FPM -
SC 4102:
Wet Bench Process Analyzer.
On-line chemical analysis allows for real-time correction of chemical composition, thus stabilizing and speeding up the process, The rewards for improved chemical control is remarkable, allowing for consistently faster processing which drastically increase throughput.
Inventory#:
34645 View
more items in this category!
EMC -
12A Eagle:
Flexible Batch Cleaning System.
Wash chamber accommo-dates up to 12 x 12 x 12 in. parts basket.
Heated spray under immersion wash cycle.
Heated open spray rinse cycle.
Open loop final rinse.
Internal filtration to 1 micron.
Forced hot air convection drying.
System Mfg. 1997.
Inventory#:
33427 View
more items in this category!
STI -
870:
Rinser/Dryer.
2 Semitool rinser/dryers mounted in a portable, wheeled console.
Wafers to 7 in. dia. Masks to 7 in. square.
Just 17-1/2 in. W x 27 in. D 73-3/8 in. H (with resistivity monitors)
Inventory#:
35783 View
more items in this category!
STI -
860:
Rinser/Dryer.
Handles substrates from 3 to 5 in.
Model 328 controllers.
1 Rinse, 2 Dry Timers with resistivity monitors.
Inventory#:
36603 View
more items in this category!
BRANSON -
MU 2112-40-24S:
Ultrasonic Tank.
Tank only, no controller.
24 element 40 kHz.
Inside Dimensions: 21 in. L x 12 in. W x 14 in. H.
Inventory#:
43793 View
more items in this category!
POLYFLOW -
S-1050:
PCB911 RTP Parts Cleaner.
System looks like it was never used, Mfg. date March 1998.
Three Tanks: 24 in. L x 14 in. W x 12 in. H.
Air actuated tank lids.
UV-IR flame detector. Acid reclaim tanks.
Overall Dimensions: 103 in. L x 60 in. W x 88 in. H.
Inventory#:
46315 View
more items in this category!
BRANSON -
BENCHMARK:
Aqueous/Semi-Aqueous Precision Ultrasonic Cleaning System.
First Tank/Heated Ultrasonic: 16 in. L x 24 in. W x 16 in. H .
Second Tank/Cascaded Heated Ultrasonic: 16 in. L x 20 in. W x 16 in. H.
Dryer section with 12 in. L x 18 in. W x 24 in. H Forced Air Dryer.
40 kHz Series 8000 ultrasonic power supplies.
Inventory#:
55266 View
more items in this category!
POLYFLOW -
S-955-N12:
Horizontal Preform Cleaner.
Rotating fixture: 8 in. dia. x 48 in. L.
4 acid storage tanks under unit.
For cleaning paddles or quartz rods or other small parts.
Inventory#:
41231 View
more items in this category!
BLUE M -
CC-09G-HTC:
Stainless Steel High Temperature Cleanroom Oven.
Mechanical convection oven.
Temp. Range: 15 deg C above ambient to 450 deg C.
Chamber: 14 in. W x 25 in. D x 21 in. H.
Exterior: 62 in. W x 46 in. D x 66 in. H.
480V, 3 Ph, 60 Hz.
Non hazardous process only.
Originally used to bake polyimides at 200 to 300 deg C.
With JC Systems 620A programmable controller, dual PID, 2 fully independent controller
channels, 99 program/200 steps/16 event setpoint programmer.
Inventory#:
48887 View
more items in this category!
K&S -
973:
High Pressure Microwash Substrate Cleaning System.
For sawed/scribed wafers or photomask cleaning.
Utilizes an oscillating high pressure deionized water jet spray of up to 2000 psi with 0.2 micron filtration.
Handles wafers up to 8 in. dia. depending on type of chuck installed.
Touch screen operation. CO2 re-ionizer for elimination of static charge.
Nitrogen dry. Infrared heat lamp.
115V, 50/60 Hz, 6A.
Inventory#:
54710 View
more items in this category!
ULTRA T EQUIPMENT -
DIR120:
CO2 Reionizing System for DI Water in Substrate Cleaners.
For elimination of electrostatic charge.
Monitors DI water resistivity.
115V, 60 Hz.
Inventory#:
49926 View
more items in this category!
MARCH INSTRUMENTS -
PX-500:
Plasma Treatment System.
Batch system for plasma cleaning or etching.
Nitrogen and two process gas inputs.
Advanced Energy RFX-600 600W 13.56 MHz RF Generator.
Two sets of shelves, two ground, two power: 8 in. W x 13 in. D.
Includes vacuum pump.
Inventory#:
55231 View
more items in this category!
UVOCS -
T10X10/OES:
Ultraviolet Ozone Cleaning System.
Fast method of obtaining ultra-clean surfaces free of organic contaminants.
10 in. x 10 in. source size. Ozone exhaust shroud. 110V. 60Hz.
Inventory#:
55094 View
more items in this category!
CREST ULTRASONICS -
4HT-1014-6:
Stainless Steel Heated Ultrasonic Bath.
Inside Dimensions: 10 in. L x 14 in. W x 10 in. D.
Crest Genesis simultaneous multi-frequency megasonic generator 40 through 90 kHz.
120V, 50/60 Hz, 12.4A.
Inventory#:
55259 View
more items in this category!
CLEANROOM SYSTEMS -
261 ECU:
Environmental Control Unit.
Process level control of temperature, humidity and pressure.
Requires cooling water.
208V, 3 Ph, 60 Hz, 34.7A, CE.
Inventory#:
52132 View
more items in this category!
BLUE M -
CC09-HTC-G:
High Speed High Temperature Clean Room Oven.
Stainless steel construction.
Digital programmable controller with overtemp protection.
Purge gas inputs. Water cooling jacket. Used Hepa filter.
Fast ramp temperature up to 450 deg C.
Inside Dimensions: 14 in. L x 25 in. W x 20 in. H.
Can be used for polyimide bake.
480V, 3 Ph, 60 Hz, 49A.
Inventory#:
54724 View
more items in this category!
EDC -
100:
Exclusive Design Rigid Disk Cleaning System.
Uses brushes and surfactant to scrub disks. LCD display.
Analog control of scrub/rinse speed and spin dry speed.
115V, 60 Hz.
Inventory#:
51023 View
more items in this category!
ACCU-FAB SYSTEMS -
ECO-SNOW:
CO2 Precision Surface Cleaning System.
For removing micron and submicron particulate and organic contamination using carbon dioxide. When aimed at a contaminated surface the CO2 snow particles dislodge particles and remove thin film organic residues.
Removing post-etch veils by momentum transfer or metal lift-off by thermal contraction and momentum transfer.
Removes organic film by solvation. Cassette to cassette operation.
Inventory#:
52338 View
more items in this category!
ULTRA T EQUIPMENT -
SCS 124:
Substrate Cleaning System for Post Dicing Clean Up.
Does not have high pressure pump option.
Uses house DI water to clean wafers while spinning, and nitrogen to dry wafers.
115V, 50/60 Hz, 6A.
Inventory#:
54797 View
more items in this category!
JELIGHT -
144AX:
UV/Ozone Cleaning System.
12 in. x 12 in. tray capacity produces near atomically clean surfaces in
less than 1 min. by utilizing the UV/Ozone cleaning method.
Optional dual media gas inputs.
120V, 60 Hz., 10A.
Inventory#:
54904 View
more items in this category!
MTI -
FLEXIFAB:
Develop Track with Brush Cleaner Module.
MTI modular track system with a dual dispense develop module, bake module, cassette robot module, control module and a wafer brush cleaner module.
Last used for 6 in. wafers.
Inventory#:
52574 View
more items in this category!
K&S -
973:
High Pressure Microwash Substrate Cleaning System.
For sawed/scribed wafers or photomask cleaning.
Utilizes an oscillating high pressure deionized water jet spray of up to 2000 psi with 0.2 micron filtration.
Handles wafers up to 8 in. dia. depending on type of chuck installed.
Touch screen operation. CO2 re-ionizer for elimination of static charge.
Nitrogen dry. Infrared heat lamp.
115V, 50/60 Hz, 6A.
Inventory#:
54734 View
more items in this category!
BLUE M -
CC04C-P-E:
Clean Room Oven.
Digital setpoint controller. Overtemp controller.
Max. Temp.: 250 deg C.
Used Hepa Filter.
Inside Dimensions: 16 in. L x 20 in. W x 20 in. H.
208V, 3 Ph, 60 Hz, 18A.
Inventory#:
54915 View
more items in this category!
YIELDUP -
OMEGA 6200:
Megasonic Wafer Cleaning System.
Robot assist between 2 tanks.
Set up for 2 - 200 mm cassettes.
Tank 1: 11 in. L x 20 in. W x 15 in. H is a quartz megasonic tank with 3 - 600W KAJO
megasonic generators.
Tank 2: 12 in. L x 20 in. W x 14 in. H is a YieldUp dryer tank with N2 purge and gas injection capability.
Mfg. Date: 12/97.
Overall Dimensions: 60 in. L x 60 in. W x 88 in. H.
Inventory#:
52683 View
more items in this category!
UVOCS -
T10X10/OES:
Ultraviolet Ozone Cleaning System.
Fast method of obtaining ultra-clean surfaces free of organic contaminants.
10 in. x 10 in. source size.
Ozone exhaust shroud. 110V. 60Hz.
Inventory#:
55318 View
more items in this category!
BLUE M -
DCC-1406-G-ST350:
Large Clean Room Oven.
Digital setpoint controller.
Used hepa filter.
Max. Temp. 250 deg C.
Inside Dimensions: 43-1/2 in. L x 24 in. W x 35-1/2 in. H.
480V, 3 Ph, 60 Hz, 31A.
Inventory#:
55454 View
more items in this category!
UVOCS -
T10X10/OES:
Ultraviolet Ozone Cleaning System.
Fast method of obtaining ultra-clean surfaces free of organic contaminants.
10 in. x 10 in. source size.
Ozone exhaust shroud. 110V. 60Hz.
Inventory#:
55416 View
more items in this category!
DELTA SONICS -
RSX1012-4G:
Ultrasonic Cleaning System.
System Configuration:
Heated Ultrasonic Tank: 12 in. L x 10 in. W x 8 in. H.
Spray Rinse: 12 in. L x x 12 in. W x 10 in. H.
Heated Ultrasonic Cascade Tank: 12 in. L x 10 in. W x 12 in. H.
Dryer Tank: 12 in. L x 9 in. W x 12 in. H.
480V, 3 Ph, 60 Hz, 25A.
Inventory#:
53568 View
more items in this category!
K&S -
973:
High Pressure Microwash Substrate Cleaning System.
For sawed/scribed wafers or photomask cleaning.
Utilizes an oscillating high pressure deionized water jet spray of up to 2000 psi with 0.2 micron filtration.
Handles wafers up to 8 in. dia. depending on type of chuck installed. Touch screen operation.
CO2 re-ionizer for elimination of static charge. Nitrogen dry. Infrared heat lamp.
115V, 50/60 Hz, 6A.
Inventory#:
54781 View
more items in this category!
K&S -
973:
High Pressure Microwash Substrate Cleaning System.
For sawed/scribed wafers or photomask cleaning.
Utilizes an oscillating high pressure deionized water jet spray of up to 2000 psi with 0.2 micron filtration.
Handles wafers up to 8 in. dia. depending on type of chuck installed. Touch screen operation.
CO2 re-ionizer for elimination of static charge. Nitrogen dry. Infrared heat lamp.
115V, 50/60 Hz, 6A.
Inventory#:
54782 View
more items in this category!
YIELD ENGINEERING -
YES-R3:
Plasma Cleaning System.
Capacitive down stream plasma.
Total plasma uniformity across planar 12 in. x 12 in. sample shelves.
Includes vacuum pump.
Inventory#:
53860 View
more items in this category!
DNS -
SSW-629-B:
Wafer Brush Scrubber with Sonic Cleaning Option.
Cassette to cassette operation. Dual track system.
While low-pressure DI water is sprayed the rotating brush scrubber head is fed across the wafer.
Includes optional D-sonic scrubbing for even higher quality cleaning.
Mfg.: Aug. 1995
Inventory#:
53908 View
more items in this category!
HEADWAY RESEARCH -
PM80:
Bench with Dual Headway Spinners for Substrate Cleaning.
Spinners for substrate cleaning.
Footswitch controlled. Handles up to 6.5 in. dia. substrate.
Variable Speed: Switch under unit allows selection of speed from 500 to 5000 rpm.
120V, 60 Hz.
Inventory#:
55428 View
more items in this category!
S&K -
IG200:
IPA Dryer.
Submersion bath and vapor zones.
Tank Dimensions: 23 in. L x 14 in. W x 16 in. H.
Functions as a dryer on aqueous and semi-aqueous systems.
Used 67 percent cyclohexane, 33 percent 2-Propanol.
No ultrasonics option.
208V, 3 Ph, 50/60 Hz, 40A.
Inventory#:
49447 View
more items in this category!
MARCH INSTRUMENTS -
PX-250:
Plasma Cleaning System.
Multiple removable shelves can easily be configured to provide downstream or direct plasma.
Shelves: 6 in. x 6 in.
300W, 13.56 MHz RF Generator.
Includes vacuum pump.
208/230V, 1 Ph, 50/60 Hz, CE.
Inventory#:
54061 View
more items in this category!
SVG -
Double Sided Brush Cleaner:
Cassette to cassette wafer cleaning track.
Load cassette keeps wafer wet while awaiting cleaning process.
2 separate double sided brush cleaning stations.
Spin rinsing station before final cassette elevator.
Can be configured for up to 150 mm wafers.
Inventory#:
54202 View
more items in this category!
YIELD ENGINEERING -
YES-R1:
Plasma Cleaning System.
Total plasma uniformity across 12.75 in. x 12.75 in. planar sample shelves, 5 shelves total.
1000W RF Generator.
Capacitive, parallel plate, downstream, charge-free plasma.
3 gas inputs. Includes vacuum pump.
Inventory#:
54275 View
more items in this category!
VERTEQ -
ST600-31LX:
Megasonic Cleaning System.
Megasonic quartz tank with overflow weir, Tank Size: 10-1/2 in. L x 10 in. W x 9 in. H.
Quick Dump Rinse with Megasonic Transducer: 9 in. L x 10-1/2 in. W x 8-1/2 in. H.
Last used for 6 in. wafers. 2 Megasonic generators.
Digital controls with LCD display. Heated filtered recirculator.
Inventory#:
54391 View
more items in this category!
STI -
ST-880:
Spin Rinse Dryer.
Capable of processing up to a max. 8 in. dia. wafer cassette with appropriate tooling.
Currently configured for 6 in. wafers.
Cleans wafers with DI water spray and drys with nitrogen. 120V, 60 Hz.
Inventory#:
54404 View
more items in this category!
CREST -
OC4-1218-HE:
Ultrasonic Cleaning Line.
Unit has rotation mechanisms on each of the tanks that spin cages that hold parts to be cleaned.
Parts Carrier Inside Dimensions: 5-3/8 in. x 5-3/8 in. x 12 in.
System can also be used as a standard unit without these carriers.
3 Heated Ultrasonic Baths: 12 L x 18 in. W x 10 in. H.
Hot Air Dryer: 12 in. L x 18 in. W x 10 in. H.
480V, 3 Ph, 50/60 Hz, 31A.
Inventory#:
54438 View
more items in this category!
BOC EDWARDS -
IGRC:
Exhaust Gas Management System. Dry abatement technology for etch exhausts. Inline gas reactor column. Uses unique hot bed reactor technology.
Provides treatment by chemical reaction to stable inert salts and treats the widest range of gases from halogens and acids to CIF3, NF3, SF6 and other halide etch compounds. Used columns. 208V, 3 Ph, 60 Hz.
Inventory#:
55008 View
more items in this category!
All items are covered by our 30-Day Right of Return and 3-Month Warranty
unless otherwise stated. For full details of this policy,
click here!
Note: All
manufacturers names and models are used for illustrative purposes only.
Any trademarks, tradenames or copyrights remain solely the property of
the manufacturer. Unless otherwise stated, all items are used, and
Bid-Service is not a manufacturer authorized representative. All images
are copyright 2001-2010 Bid-Service LLC/Sci-Quip and may not be used for
any purpose without prior written permission
BRANSON -
BENCHMARK:
Aqueous/Semi-Aqueous Precision Ultrasonic Cleaning System.
First Tank/Heated Ultrasonic: 16 in. L x 24 in. W x 16 in. H .
Second Tank/Cascaded Heated Ultrasonic: 16 in. L x 20 in. W x 16 in. H.
Dryer section with 12 in. L x 18 in. W x 24 in. H Forced Air Dryer.
40 kHz Series 8000 ultrasonic power supplies.
Inventory#:
55266 
