Used and Refurbished Semiconductor Processing Exposure Systems
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OPTICAL RADIATION CORP
OPTIBEAM 5050
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$1,250 AS IS
OPTICAL RADIATION CORP -
OPTIBEAM 5050:
Photoprinter System UV Exposure.
For exposure of ultraviolet sensitive materials.
Can handle single as well as double-sided exposure.
5000W. lamp.
Exposure Area: 24 in. x 30 in. Max.
AS IS. 30 DAY ROR.
Inventory#:
36534 View
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SVG/SITE SERVICES -
8632CTD/8636HPO:
Developer-Exposure Track.
Single track developer configured with 2 elevators, one spinner and one bake.
System has an OAI 0130-042-20 deep UV.
220 nanometer exposure tower capable of up to 2000W.
Currently configured for 4 in. wafers.
Inventory#:
41192 View
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PANACOL-ELOSOL -
UV-D-400:
UV Conveyor System.
Fast curing of UV adhesives and potting materials.
220V, 50 Hz.
Inventory#:
49288 View
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OAI -
316:
UV Exposure Meter.
Provides key exposure measurements of energy intensity and time.
120V, 60 Hz.
Inventory#:
49739 View
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ULTRON -
UH 102:
UV Curing System. For the curing of UV films.
Nitrogen blanket to assure complete curing of the UV adhesives. Microprocessor based programmable controller.
Inventory#:
51496 View
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OAI -
0130-042-20:
2000W Deep UV Exposure Tower with Power Supply.
Max. Power Output: 2000W.
Wavelength: 220 nm.
Sensor: 220/260.
Final Lens: 4-7/8 in. dia.
Inventory#:
55317 View
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ULTRON -
UH 102:
UV Curing System. For the curing of UV films. Nitrogen blanket to assure complete curing of the UV adhesives. Microprocessor based programmable controller. 115V, 60 Hz, 10A, CE
Inventory#:
52539 View
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ULTRON -
UH 102:
UV Curing System. For the curing of UV films.
Nitrogen blanket to assure complete curing of the UV adhesives. Microprocessor based programmable controller.
Inventory#:
52970 View
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THERMO ORIEL -
ACCUDOSE 9000:
Photospeed Tool Measures Batch to Batch Photospeed Variations.
Photoresist testing system. Oriel part 83995 near UV system with fast shutter.
Assures that exposure dosage is in-line with your process window requirements.
No need to sideline your expensive stepper for photoresist testing.
Provides accurate, incremented bulk area exposures across a wafer.
Use it to quantify threshold exposure, spectra variations, find potential resist problems and verify lot to lot consistency.
Inventory#:
53217 View
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OAI -
2000-006-02:
Cassette to Cassette UV Flood Exposure System.
System includes a UV light source, intensity controlling power supply and robotic substrate handling subsystem.
PC controller. 500W NUV Lamp House: 360-440 nm.
5 in. dia. collimated lense.
120V, 50/60 Hz.
Inventory#:
53249 View
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AB-M -
Mask Aligner:
Mask Aligner and Exposure System. 350W lamp housing with power supply. Final Lens: 6-1/2 in. x 6-1/2 in. Precision alignment stage. Mask Holder: 4 in. x 4 in. with 2-1/8 in. x 2-1/8 in. substrate holder. Exposure timer. Single StereoZoom microscope for alignment, not split field. 120V, 50/60 Hz.
Inventory#:
53380 View
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OAI -
J500/VIS:
Deep UV Mask Aligner and Exposure System with Split Field Alignment Optics.
High performance high resolution mask aligner.
2000W deep UV light source 220/260 nanometers.
6 in. dia. vacuum chuck.
Split Field alignment optics with cameras, monitors and fiber optic illuminators.
Exposure timer. Nitrogen flow control.
Micrometer control of chuck X, Y, Z and Theta.
Inventory#:
54738 View
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FUSION -
150PC:
Photoresist Photostabilization System.
Fusions rapid, one-step UV/Bake process replaces a standard resist hard bake and allows for higher process margins and increased process consistency.
Cassette to cassette handling of wafers up to 150 mm.
208V, 3 Ph, 60 Hz, 21A.
Inventory#:
53613 View
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ULTRON -
UH 102:
UV Curing System. For the curing of UV films.
Nitrogen blanket to assure complete curing of the UV adhesives. Microprocessor based programmable controller.
Inventory#:
50810 View
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ORIEL -
82440:
Large Area UV Exposure System. Final Lens: 12 in. dia. Max. Lamp Power: 1000W.Spectral Region: 350 to 450 nm. 220V, 50/60 Hz, 20A.
Inventory#:
53651 View
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OAI -
0950-0360-01:
Cassette to Cassette UV Flood Exposure System.
System includes a robotic substrate handling system,
UV lamp housing and intensitiy controlling power supply.
Lamp housing will support up to 1000W lamp.
Configured for 365 to 400 nm.
Max. Exposure Area: 6 in. dia.
120V, 60 Hz.
Inventory#:
54130 View
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ORIEL -
87130:
Exposure Tower with Power Supply. Final Lens: 7 in. dia. Beam Size: 4-1/4 in. x 4-1/4 in. Wavelength: 350 nm to 450 nm. 200W lamp.
110V, 50/60 Hz, 15A. Older system but sold in good working condition.
Inventory#:
55021 View
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