Used and Refurbished Semiconductor Processing PECVD Equipment
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AVIZA PANTHEON
300 ALD
$-
AVIZA PANTHEON -
300 ALD:
Atomic Layer Deposition System.
300mm Nano-ALD System. 3 Chamber, High K-NOLA.
Mfg.: 8/2005. Original Cost: $3,740,000.00.
More information to come contact us for details.
Inventory#:
55442 View
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GEMINI -
3:
Dual Chamber Epitaxial Reactor.
Gas Panel: The gas panel is equipped to handle one silicon flow stream and two dopant flow streams. All lines in the gas panel, as well as the lines leading to the reactor, have been cleaned and passivated. All valves have been cleaned, tested, and replaced as needed. All MFC’s have been cleaned and calibrated, however, the MFC’s for the silicon source and HCl have been replaced. The gas panel has passed a leak check test after reassembly.
Controls and Electronics: An updated industrial computer (Advantech) and new control software has been installed. All PLC’s have been checked and replaced as needed. All inputs and outputs, as well as logic, have been tested to work with the PLC’s. All interlocks have been checked.
Pneumatics: All pneumatic lines and fittings have been checked and replaced as needed. This includes the lines going to the gas delivery system. The larger pneumatic lines and fittings going to the system exhaust, vacuum, and bell jar lift have been checked and replaced as needed. The pneumatic regulators have also been checked and replaced as needed.
Water Cooling System: The water cooling lines and fittings have been checked and replaced as needed. The incoming water valves, together with its associated sensors, have been checked, cleaned, and replaced as needed. The entire cooling water system has been checked and is free from flow restrictions, corrosion, and leaks.
Electro-Mechanical: The bell jar lift and clamping mechanism has been checked. The air cooling system and blowers have been checked and replaced as needed. The Hepa filters and pre-filters have been checked and replaced as needed. The reactor door seals and also the susceptor rotation mechanism have been checked.
Process Chamber (1): All quartzware is in working condition, however, there is no warranty on such used quartzware. All O-rings used in the process chambers and feedthroughs have been replaced. All sealing surfaces have been checked for leaks and pitting, and have been re-machined as needed. Each process chamber has been leak checked in nitrogen.
Process Chamber (2): There will be no susceptors (new or used) supplied with the system. The customer is responsible for ordering their own susceptors. No RF Generator.
Inventory#:
50595 View
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EMCORE -
D-180 MOCVD:
TurboDisc CVD System.
Previously used for nitride deposition on 3 in. wafers.
Used only 6 gases.
Never used magnesium or zinc.
Good for electrical or optical component manufacturing.
Inventory#:
52362 View
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