Used and Refurbished Photoresist Track Processing Equipment
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SVG
90 Series
-
$19,000 AS IS
SVG -
90 Series:
UV Coat & Develop Tracks.
Configured for 200 mm wafers. 4 Elevators Model 90211S.
Two track system one side with 3 develop stations and one side with 2 coat stations.
Glass enclosure with HEPA filtered hood, ion system static control, Semifab RAM 3500 environmental control unit and a Donaldson high purity products counter-flow adsorber module.
Two tank chemical cabinet with 4 DI water tanks and pumps.
Stepper interface module.
Top and bottom edge bead removal.
Spatula transfer arms between bake and chill plates.
Backside wash on develop station.
Modules (1)-57185, (2)-9037, (4)-9044, (2)-9026, (1)-9038, (3)-9036, (3)-9032.
SOLD AS IS.
Inventory#:
34337 View
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SVG/SITE SERVICES -
8632CTD/8636HPO:
Developer-Exposure Track.
Single track developer configured with 2 elevators, one spinner and one bake.
System has an OAI 0130-042-20 deep UV.
220 nanometer exposure tower capable of up to 2000W.
Currently configured for 4 in. wafers.
Inventory#:
41192 View
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SVG -
8626 PC:
Cassette to Cassette Single Track Photoresist Coater.
Model 8626 PC/8636 HPO programmable controller.
Configuration: Elevator - Spin Coater - Elevator.
System can be configured for wafers up 6 in. dia.
Inventory#:
40115 View
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FAS TECHNOLOGIES -
MicroE™ 200:
Extrusion Coating System.
Uses high precision extrusion technology to coat materials in a wide range of viscosities.
Coats very thick layers (100 micrometers) in a single step. Repeatable digitally programmed process.
Greater material utilization than spin coating (typical 75 percent of dispensed material remains on the wafer).
Inventory#:
42576 View
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FAS TECHNOLOGIES -
MicroE™ 200:
Cassette to Cassette Extrusion Coating System with Stacked Bake/Chill Oven.
System is capable of coatings over 100 micron thick in one process step
with uniformities surpassing +/- 2 percent.
Material utilization is 75 percent compared to 5-10 percent for spin coating.
This means lower cost of material and reduced expense of waste disposal.
Increased process uniformity.
Uses high precision extrusion technology.
Ability to coat materials in a wide range of viscosities.
Repeatable digitally programmed process.
With Genmark Mini Max Gencobot 7S/3L Handler.
Model JS-9940 stacked bake unit with 3 ovens.
Inventory#:
42901 View
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MTI/S3 -
MULTIFAB:
Photoresist Coating Track System.
Wafer is transferred from elevator to bake and spin coat modules via robotic arm.
All process parameters are programmed on
the system monitor using a light pen.
Inventory#:
51541 View
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MTI -
FLEXIFAB:
Automated Photoresist Coater.
Robot arm transfers wafers between the cassette elevator, the bake module and the spin coat module.
No photoresist pumps.
Stainless steel construction.
Inventory#:
51542 View
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MTI -
FLEXIFAB:
Develop Track with Brush Cleaner Module.
MTI modular track system with a dual dispense develop module, bake module, cassette robot module, control module and a wafer brush cleaner module.
Last used for 6 in. wafers.
Inventory#:
52574 View
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THERMO ORIEL -
ACCUDOSE 9000:
Photospeed Tool Measures Batch to Batch Photospeed Variations.
Photoresist testing system. Oriel part 83995 near UV system with fast shutter.
Assures that exposure dosage is in-line with your process window requirements.
No need to sideline your expensive stepper for photoresist testing.
Provides accurate, incremented bulk area exposures across a wafer.
Use it to quantify threshold exposure, spectra variations, find potential resist problems and verify lot to lot consistency.
Inventory#:
53217 View
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DNS -
SSW-629-B:
Wafer Brush Scrubber with Sonic Cleaning Option.
Cassette to cassette operation. Dual track system.
While low-pressure DI water is sprayed the rotating brush scrubber head is fed across the wafer.
Includes optional D-sonic scrubbing for even higher quality cleaning.
Mfg.: Aug. 1995
Inventory#:
53908 View
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SVG/AIO CORPORATION -
8626PC/8636HPO:
Single Track Spin Coater.
86 Series fully automated spin coating track system.
Configuration: Elevator, Elevator, Spin Coater, Bake, Bake, Elevator, Elevator.
Currently configured for 4 in. wafers.
No resist pumps included. 208V, 3 Ph, 60 Hz.
Inventory#:
55381 View
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All items are covered by our 30-Day Right of Return and 3-Month Warranty
unless otherwise stated. For full details of this policy,
click here!
Note: All
manufacturers names and models are used for illustrative purposes only.
Any trademarks, tradenames or copyrights remain solely the property of
the manufacturer. Unless otherwise stated, all items are used, and
Bid-Service is not a manufacturer authorized representative. All images
are copyright 2001-2010 Bid-Service LLC/Sci-Quip and may not be used for
any purpose without prior written permission
SVG/AIO CORPORATION -
8626PC/8636HPO:
Single Track Spin Coater.
86 Series fully automated spin coating track system.
Configuration: Elevator, Elevator, Spin Coater, Bake, Bake, Elevator, Elevator.
Currently configured for 4 in. wafers.
No resist pumps included. 208V, 3 Ph, 60 Hz.
Inventory#:
55381 
