Click here to visit the main Bid-Service Website

The world leader in used high-technology equipment

Your one source for fully reconditioned used Laboratory, Test, Semiconductor Processing and Scientific Equipment

Search!

Sorry you need Java!

A large in-stock inventory to meet your needs!

Phone: 732-863-9500
FAX: 732-863-1255
Email: Sales

Have equipment
sitting idle?

We're always
in the market for quality high-tech equipment!

Click Here!

MRC Inventory in Stock:

Manufacturer/Model Description

Info
MRC  603 3 Target RF/DC Sputtering System with RF Etch and Load Lock Chamber. System upgraded to PC controller capable of RF or DC sputtering but currently configured with three 4-3/4 in. x 14-7/8 in. DC cathodes. RF etch platform. 3 gas inputs controlled by MFC, previous gas used: O2, N2, AR. Advanced Energy MDX DC power supply. CTI-8 cryopump with compressor and roughing pump. RGA available at additional cost.. $49,000 View Details and Photo
MRC  603 3 Target RF/DC Sputtering System with RF Etch and Load Lock Chamber. System upgraded to PC controller capable of RF or DC sputtering but currently configured with three 4-3/4 in. x 14-7/8 in. DC cathodes. RF etch platform. 3 gas inputs controlled by MFC, previous gas used: O2, N2, AR. Advanced Energy MDX DC power supply. CTI-8 cryo pump with compressor and roughing pump. RGA available at additional cost.. $49,000 View Details and Photo
MRC  603 3 Target RF/DC Sputtering System with RF Etch and Load Lock Chamber. System upgraded to PC controller capable of RF or DC sputtering but currently configured with three 4-3/4 in. x 14-7/8 in. DC cathodes. RF etch platform. 3 gas inputs controlled by MFC, previous gas used: O2, N2, AR. Advanced Energy MDX DC power supply. CTI-8 cryopump with compressor and roughing pump. RGA available at additional cost.. $49,000 View Details and Photo
MRC  603-II Side Sputtering System w/Etch Capabilities. Currently configured with 3 D.C. Magnetron Cathodes (inset cathodes). Alcatel 2033 Roughing Pump. CTI-8 Cryopump. 1500W RF Generator. Automatic or manual controls for vacuum system and sputtering process. 4 process gas capability. Average cycle time: 13.0 minutes. Typical target utilization: Ti-W Inset 35 percent, Al Inset 50 percent. Cathode size: 4-3/4 in. x 14-7/8 in. Sputter etch: 1.5 kW RF. CRT screen monitoring, keyboard parameter control, full automation. With manuals. 208V, 60 Hz, 3 Ph, 110A.. $69,000 View Details and Photo

All items are covered by our 30-Day Right of Return and 3-Month Warranty unless otherwise stated. For full details of this policy, click here!

Note: All manufacturers names and models are used for illustrative purposes only. Any trademarks, tradenames or copyrights remain solely the property of the manufacturer. Unless otherwise stated, all items are used, and Bid-Service is not a manufacturer authorized representative. All images are copyright 2001, 2002, 2003, 2004, 2005, 2006, 2007 Bid-Service LLC/Sci-Quip and may not be used for any purpose without prior written permission

  IMPORTANT NOTICE: Due to circumstances beyond our control, our email server was off-line from 12/26/08 until 1/4/09. If you sent email to us during this period, please assume we have not seen it and resend it. Thank you for your cooperation!