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A few of the manufacturers in stock: Advanced Energy, AMI-Presco, Applied Materials, Anritsu, Balzers, Bausch & Lomb, Blue-M, CTI, Dage, Disco, Ebara, Edwards, ENI, ESI, Fluke, Hitachi, HP, Inficon, Instron, K&S, Keithley, Kepco, Lambda, Lauda, Leica, Leitz, Leybold, Micromanipulator, MKS, MRC, Nanometrics, Neslab, Nikon, Olympus, Perkin Elmer, Prometrix, Reichert, Rucker & Kolls, SemiGas, Semitool, Signatone, Sorensen, SSEC, STI, Strasbaugh, SVG, Tegal, Tektronix, Temescal, Tencor, Varian, Veeco, Verteq, West Bond, Wild, Yield, Zeiss

Inventory in Stock, Manufacturer O
(No Olympus)

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Manufacturer/Model Description

Info
OAI  0950-0360-01 Cassette to Cassette UV Flood Exposure System. System includes a robotic substrate handling system, UV lamp housing and intensitiy controlling power supply. Lamp housing will support up to 1000W lamp. Configured for 365 to 400 nm. Max. Exposure Area: 6 in. dia. 120V, 60 Hz.. $35,000 View Details and Photo
OAI  2000-006-02 Cassette to Cassette UV Flood Exposure System. System includes a UV light source, intensity controlling power supply and robotic substrate handling subsystem. PC controller. 500W NUV Lamp House: 360-440 nm. 5 in. dia. collimated lense. 120V, 50/60 Hz.. $39,000 View Details and Photo
OAI  316 UV Exposure Meter. Provides key exposure measurements of energy intensity and time. 120V, 60 Hz.. $1,250 View Details and Photo
OAI  5000-063419 High Performance Deep UV Cassette to Cassette Proximity/Contact Mask Aligner. Graphical Windows user interface. Currently configured for 6 in. dia. wafers. 2000W deep UV light source. Robotic wafer transfer of wafers. Substrate chuck motion X,Y,Z and Theta. Split field optics for alignment.. $49,000 View Details and Photo
OAI  J500/VIS Mask Alignment and Exposure System. 200W NUV lamp with power supply. Configured for 360 to 400 nm. Single StereoZoom microscope, does not have split field optics alignment. Final Lens Size: 6 in. x 6 in. 120V, 50/60 Hz.. $25,000 View Details and Photo
OAI  J500/VIS Deep UV Mask Aligner and Exposure System with Split Field Alignment Optics. High performance high resolution mask aligner. 2000W deep UV light source 220/260 nanometers. 6 in. dia. vacuum chuck. Split Field alignment optics with cameras, monitors and fiber optic illuminators. Exposure timer. Nitrogen flow control. Micrometer control of chuck X, Y, Z and Theta.. $35,000 View Details and Photo
OHAUS  AR3130 Analytical Balance. Draft shield. Capacity: 310 g. Readability: 0.001 g. Repeatability: 0.001 g. LCD display. 120V, 60 Hz, CE.. $950 View Details and Photo
OHAUS  CQ50L33 Champ Bench Scale. 11 key numeric keypad. Platform: 18 in. x 18 in. Capacity: 10 lbs. Readability: 0.005 lbs. 120V, 60 Hz, CE.. $400 View Details and Photo
OLITE  AL 13 Tri-Level Printing Lamp with Integrator Timer. Integrator timer controls lamp and shutter. No UV cell with integrator. L900 multi spectrum lamp. 120V, 60 Hz.. $950 View Details and Photo
OMEGA  DFG60-11 Digital Force Gauge. Capacity (resolution): 11.02 lb (0.01 lb), 5.000 Kg (0.001 Kg).. $350 View Details and Photo
OMEGA ENGINEERING  OM 372 Data Logger.. $495 View Details and Photo
OMEGA ENGINEERING  RD-115-T Multi-Pen Programmable Chart Recorder. Full-scale range, chart speed and alarms can be programmed. Versatile digital printout functions. Multiple inputs. 115V, 60 Hz. . $1,750 View Details and Photo
OMEGALINE  630-1K Omegaline 630 Compact Chart Recorder configured with one K Thermcoiple module 200 deg. C Span, five ranges. -50 - 150 deg. C , 100-300 deg. C , 200-400 deg. C, 300-500 deg. C , 400-600 deg. C.. $295 View Details and Photo
ONTRAK  DSS-200 CMP Double Sided Brush Cleaner with Megasonics. Double sided wafer cleaner. Mfg. Date: 10/97.. $45,000 View Details and Photo
ONTRAK  DSS-200 CMP Double Sided Brush Cleaner with Megasonics. Double sided wafer cleaner. Mfg. Date: 10/97.. $45,000 View Details and Photo
OPAL  VACUUM CHAMBER STAGE Large stage previously used inside an Opal 7830 Electron Microscope under high vacuum. 8 in. x 15 in. stage movement. No controller or power supply. Not motor driven. Magnetic driven stage.. $4,500 View Details and Photo
OPREL TECHNOLOGIES  COPS2-320 Test System.. $750 View Details and Photo
OPTICAL GAGING PRODUCTS  IQ 1000 Three-Dimensional Video Coordinate Measuring System. Automatically analyzes video images of objects for dimensional measurements. The IQ then takes those measurements and compares them to nominal values and tolerances to identify conditions of non-conformance. Includes 4 basic subsystems: Mechanical Motion System. Imaging System: Consisting of the image forming optics, illumination devices, and the image sensing video camera. Image Processing system: The feature extraction, identification, and measurement capabilities. Operator Workstation: Computer and input devices where all programming operations are executed and where measurement results and machine status are displayed.. $12,500 View Details and Photo
OPTICAL RADIATION CORP  OPTIBEAM 5050 Photoprinter System UV Exposure. For exposure of ultraviolet sensitive materials. Can handle single as well as double-sided exposure. 5000W. lamp. Exposure Area: 24 in. x 30 in. Max. AS IS. 30 DAY ROR.. $1,250 AS IS View Details and Photo
ORANGE ENGINEERING  VAC-Q-LAM Vacuum Laminating Press. Industrial PC controller. Platen Size: 16 in. x 16 in. Number of Openings: 4. Daylight: 3 in. All platens heated, right and left zone on all 4 platens and top platen. Eurotherm 94 deg.C digital temperature controllers. High pressure gauge maximum possible reading 100,000 lbs/force. Nice Condition. . $14,950 View Details and Photo
ORIEL  77765 Beam Steerer. Beam steerer only, no controller or cables. 220V.. $650 View Details and Photo
ORIEL  82440 Large Area UV Exposure System. Final Lens: 12 in. dia. Max. Lamp Power: 1000W.Spectral Region: 350 to 450 nm. 220V, 50/60 Hz, 20A.. $12,500 View Details and Photo
ORIEL  87130 Exposure Tower with Power Supply. Final Lens: 7 in. dia. Beam Size: 4-1/4 in. x 4-1/4 in. Wavelength: 350 nm to 450 nm. 200W lamp. 110V, 50/60 Hz, 15A. Older system but sold in good working condition. . $4,950 View Details and Photo
ORIEL  92530-1000 Flood Exposure Source. Final Lens:10 in. dia. 6 in. x 6 in. exposure system. 1000W lamp house with 1000W power supply. Wavelength: 350 to 450 nm. Light intensity control and timer control. 220/240V, 50/60 Hz, 11A, CE.. $12,500 View Details and Photo
ORTHODYNE  20B Ultrasonic Large Wire Bonder. Semiautomatic operation, automatic adjustable looping and stepback produce uniform loop heights for more consistent, higher quality bonds. Wire Size: 4 to 20 mil. 115V, 50/60 Hz.. $8,500 View Details and Photo
ORTHODYNE  M20 Ultrasonic Heavy Wire Bonder. Automatic adjustable looping and stepback produce uniform loop heights for high quality bonds. Bonds 4 to 20 mil wire. Semiautomatic and manual modes. 110V, 50/60 Hz.. $8,500 View Details and Photo
OSAKA VACUUM  TG 1810 Turbopump with Controller. Volume flow rate: 1800 l/s. 10 in. ID ISO flange. 200/220V, 50/60 Hz.. $9,500 View Details and Photo
OXFORD  PLASMALAB 80 PLUS Compact Flexible Reactive Ion Etcher. PC controller with Windows reg.trademark software and advanced graphics and process recipe pages. Open load design allows for fast loading and unloading. Remote gas box with 5 mass flow controllers. Previous gases used: CF4, CHF3, O2, Argon, SF6. 208V, 3 Ph, 50/60 Hz. . $65,000 View Details and Photo
OXFORD INTRUMENTS  monoCL High Performance Cathodoluminescence System. For use with a scanning electron microscope.. $6,950 View Details and Photo

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Note: All manufacturers names and models are used for illustrative purposes only. Any trademarks, tradenames or copyrights remain solely the property of the manufacturer. Unless otherwise stated, all items are used, and Bid-Service is not a manufacturer authorized representative. All images are copyright 2001, 2002, 2003, 2004, 2005, 2006, 2007 Bid-Service LLC/Sci-Quip and may not be used for any purpose without prior written permission

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