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Tegal Inventory in Stock:

Manufacturer/Model Description

Info
TEGAL  6000 3 Chamber Magnetically Enhanced Reactive Ion Etching System (MERIE). Designed to etch metals, dielectrics and III-V compounds. Tool configured to handle 150 mm wafers. Additional photos available.. $125,000 View Details and Photo
TEGAL  801 Inline Plasma Etcher. Fully automatic, microprocessor-based, plasma chemistry etcher designed especially for the etching of thin films deposited on semiconductor wafers. All gas flow rates controlled by mass flow controllers.. $19,500 View Details and Photo
TEGAL  803 Inline Automatic Plasma Etcher. The Plasma Inline 803 is a fully automatic, microprocessor-based plasma chemistry etcher designed especially for the etching of silicon dioxide (Si02) thin film deposited on single crystal or polysilicon semiconductor wafers. It provides up to four process gases, two process channels and a clean channel.. $19,500 View Details and Photo
TEGAL  900E Cassette to Cassette Single Wafer Photoresist Stripper. Low particulate spatula handling system. System configured for 4 in. wafers. CRT with process graphics. ENI 13.56 MHz RF Generator. With roughing pump. . $29,000 View Details and Photo
TEGAL  900E Cassette to Cassette Photoresist Strip/Backside Etching. Spatula wafer transport from cassette to cassette. Users are guided through programming and operation by menu-driven software and soft-keys via a built in display and an external terminal. System is currently configured for 4 in. wafers.. $29,000 View Details and Photo
TEGAL  901E Cassette to Cassette Polysilicon/Silicon Nitride Plasma Etcher. Currently configured for 3 in. wafers. 13.56 MHz RF Generator. Easy to use menu driven control. Input gases controlled by MFC, up to 4 MFC with system. Non-friction spatula wafer transport. System comes with oxygen service pump.. $29,000 View Details and Photo
TEGAL  903E Cassette To Cassette In-line Single Wafer Plasma Etcher. Capability to etch vias and contacts with anisotropic or sloped profiles. For etching silicon dioxide, silicon nitrides, and polyimides. Can handle wafers from 3 in. to 6 in. but currently configured for 5 in. wafers. Microprocessor control. 208 V, 50/60 Hz.. $29,000 View Details and Photo

All items are covered by our 30-Day Right of Return and 3-Month Warranty unless otherwise stated. For full details of this policy, click here!

Note: All manufacturers names and models are used for illustrative purposes only. Any trademarks, tradenames or copyrights remain solely the property of the manufacturer. Unless otherwise stated, all items are used, and Bid-Service is not a manufacturer authorized representative. All images are copyright 2001, 2002, 2003, 2004, 2005, 2006, 2007 Bid-Service LLC/Sci-Quip and may not be used for any purpose without prior written permission

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